EPI And MOCVD

SIAMC's graphite components and insulation materials are widely used in semiconductor epitaxial equipment due to their excellent thermal and mechanical properties. In epitaxial growth processes, high-purity graphite is used for the hot wall reactor components such as heater, susceptor, gas injector, and gas distribution plate. The low impurity content of SIAMC's graphite products ensures high process purity and reduces particle generation during high-temperature processing.

In addition, SIAMC's insulation materials, are used for insulation and heat preservation in the epitaxial equipment to maintain high process temperature and reduce heat loss. These materials have excellent thermal insulation properties and high-temperature resistance, ensuring stable and efficient operation of the equipment.

Overall, SIAMC's graphite components and insulation materials play a critical role in ensuring the quality and yield of epitaxial growth processes, making them essential for semiconductor manufacturing.